The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
Mar. 31, 2004
Yasushi Okubo, Tokyo, JP;
Yasunori Yokoya, Tokyo, JP;
Yasushi Okubo, Tokyo, JP;
Yasunori Yokoya, Tokyo, JP;
Hoya Corporation, Tokyo, JP;
Abstract
In the photomask blank, which is an original plate of a transfer mask having a transfer pattern to be transferred to the body to be subjected to transfer on the substrate, the photomask blankincludes a light shielding filmbecoming the transfer pattern and a resist filmon the substrate, and the resist filmformed on the peripheral edge of the main surface of the substrateis removed in a predetermined region in a supported regionof the photomask blanksupported by the substrate holding member of the exposure device, so that a desired pattern positional accuracy and a desired focus accuracy are obtained, when the transfer mask having the transfer pattern obtained by patterning the light shielding filmis supported by the substrate holding member of the exposure device. With this structure, when a reticle is mounted on the substrate holding member of a stepper, the deformation of the reticle is suppressed, and lowering of a positional accuracy of the transfer pattern and the lowering of a focus accuracy can be suppressed to minimum.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile