The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Apr. 05, 2012
Applicants:
Takeyuki Yamada, Shinjuku-ku, JP;
Toshiyuki Suzuki, Shinjuku-ku, JP;
Masahiro Hashimoto, Shinjuku-ku, JP;
Yasunori Yokoya, Shinjuku-ku, JP;
Inventors:
Takeyuki Yamada, Shinjuku-ku, JP;
Toshiyuki Suzuki, Shinjuku-ku, JP;
Masahiro Hashimoto, Shinjuku-ku, JP;
Yasunori Yokoya, Shinjuku-ku, JP;
Assignee:
Hoya Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
Abstract
Provided is a mask blank surface treatment method for surface-treating, using a treatment liquid, a surface of a thin film, to be formed into a transfer pattern, of a mask blank having the thin film on a substrate. The thin film is made of a material that can be etched by ion-based dry etching. The concentration of an etching inhibitor contained in the treatment liquid is 0.3 ppb or less.