Yasuhito Shiho

Title: Yasuhito Shiho: Innovator in Semiconductor Technology

Introduction

Yasuhito Shiho is a prominent inventor based in Austin, TX (US), known for his significant contributions to semiconductor technology. With a total of 4 patents to his name, he has made remarkable advancements in the field, particularly in the fabrication methods of semiconductor devices.

Latest Patents

One of his latest patents is titled "Self correcting suppression of threshold voltage variation in fully depleted transistors." This innovative semiconductor fabrication method involves implanting or introducing a counter doping impurity distribution into a semiconductor top layer of a silicon-on-insulator (SOI) wafer. The method ensures that the net charge deposited in the semiconductor top layer varies linearly with thickness variation, leading to a uniform threshold voltage for fully depleted transistors. Another notable patent is the "Method for making a semiconductor device with strain enhancement." This patent describes a process for forming a semiconductor device with strain enhancement by utilizing a semiconductor substrate and an overlying control electrode, which enhances the performance of the device.

Career Highlights

Yasuhito Shiho has worked with leading companies in the semiconductor industry, including Freescale Semiconductor, Inc. and Motorola Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to the advancement of semiconductor technology.

Collaborations

Throughout his career, Yasuhito has collaborated with notable colleagues such as Carole C Barron and Da Zhang. These collaborations have further enriched his work and have led to significant advancements in the field.

Conclusion

Yasuhito Shiho's contributions to semiconductor technology through his patents and career achievements highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor devices.