Chiyoda-ku, Japan

Yasuhisa Sone



Average Co-Inventor Count = 4.5

ph-index = 4

Forward Citations = 53(Granted Patents)


Location History:

  • Chiba, JP (1998)
  • Funabashi, JP (1999 - 2002)
  • Chiyoda-ku, JP (2009)

Company Filing History:


Years Active: 1998-2009

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Yasuhisa Sone in Semiconductor Technology

Introduction: Yasuhisa Sone, based in Chiyoda-ku, Japan, is a talented inventor renowned for his significant contributions to the field of semiconductor technology. With a total of four patents to his name, Sone’s work focuses on enhancing lithography processes, which are essential for the production of semiconductor devices.

Latest Patents: One of Yasuhisa Sone's latest patents is centered around a composition for forming a gap-filling material for lithography. This innovative composition serves as an outstanding gap-filling material, especially for substrates that have irregularities such as holes or trenches. Notably, it allows for a high level of planarization ability, prevents intermixing with the resist layer, and boasts a high dry etching rate compared to the resist itself. This composition is critical in the production of semiconductor devices, as it is utilized to cover the resist on substrates that have holes with an aspect ratio of 1 or more, facilitating the transfer of images through a lithographic process. The composition is distinguished by its polymer solution that consists of a polymer and a solvent. Another key patent of his includes thermosetting anti-reflective coatings designed for the full-fill dual damascene process, further showcasing his inventive capabilities.

Career Highlights: Throughout his career, Sone has made substantial contributions while working with various companies, including Brewer Science, Inc. and Nissan Chemical Industries Limited. His work in these organizations has been integral to advancing semiconductor technologies.

Collaborations: In his journey as an inventor, Yasuhisa Sone has collaborated with notable colleagues, such as Ram W. Sabnis and Edith G. Hays. These partnerships have played an essential role in the development and refinement of his innovative patents.

Conclusion: Yasuhisa Sone's contributions to semiconductor technology through his patents reflect a deep commitment to innovation and improvement in lithography processes. His work not only enhances the efficiency of semiconductor production but also propels the industry forward. As technology evolves, the impact of inventors like Sone remains profound and essential to future advancements.

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