Yasuhisa Kitahata

Title: Yasuhisa Kitahata: Innovator in Photomask Technology

Introduction

Yasuhisa Kitahata is a prominent inventor based in Tokyo-to, Japan. He is known for his significant contributions to the field of photomask technology, which plays a crucial role in photolithography processes used in semiconductor manufacturing.

Latest Patents

Yasuhisa Kitahata holds a patent for a photomask that enhances imaging performance. This innovation allows for the formation of high-quality micro images on a wafer in photolithography with a half pitch of 60 nm or less. The photomask is designed for use with an ArF excimer laser as an exposing source for immersion exposure, utilizing quadrupole-polarized illumination with a high-NA lens. The patent details the specific adjustments of the mask pattern, including the thickness of the light shielding film, refractive index, extinction factor, and bias of the mask pattern, ensuring that the optical image contrast exceeds 0.580.

Career Highlights

Yasuhisa Kitahata is associated with Dai Nippon Printing Co., Ltd., where he has made significant strides in photomask technology. His work has been instrumental in advancing the capabilities of photolithography, which is essential for the production of integrated circuits.

Collaborations

Yasuhisa Kitahata has collaborated with notable colleagues, including Yasutaka Morikawa and Takashi Adachi. Their combined expertise has contributed to the development of innovative solutions in the field of photomask technology.

Conclusion

Yasuhisa Kitahata's contributions to photomask technology exemplify the importance of innovation in the semiconductor industry. His patent reflects a commitment to enhancing imaging performance, which is vital for the advancement of modern electronics.