Yasuhiro Oura

Title: Yasuhiro Oura: Innovator in Silicon Wafer Technology

Introduction

Yasuhiro Oura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of silicon wafers. With a total of four patents to his name, Oura's work has had a substantial impact on the industry.

Latest Patents

Oura's latest patents include innovative methods for producing silicon wafers for Insulated Gate Bipolar Transistors (IGBTs) and manufacturing Silicon-On-Insulator (SOI) wafers. The first patent describes a process for creating a silicon wafer by forming an ingot with a low interstitial oxygen concentration using the Czochralski method. This involves doping the ingot with phosphorus through neutron beam irradiation, slicing the wafer, and performing annealing in an oxidizing atmosphere. The second patent outlines a method for manufacturing SOI wafers, which includes rapid thermal annealing of an active layer wafer, forming insulating films, bonding the active layer to a support wafer, and enhancing bonding strength through heat treatment.

Career Highlights

Yasuhiro Oura is currently employed at Sumco Corporation, a leading company in the semiconductor industry. His work at Sumco has allowed him to focus on advancing silicon wafer technology, contributing to the efficiency and performance of semiconductor devices.

Collaborations

Oura has collaborated with notable colleagues such as Shigeru Umeno and Koji Kato. These partnerships have fostered innovation and have been instrumental in the development of new technologies in the semiconductor field.

Conclusion

Yasuhiro Oura's contributions to silicon wafer technology exemplify his dedication to innovation in the semiconductor industry. His patents and work at Sumco Corporation highlight his role as a key figure in advancing this critical technology.