This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Inter-University Research Institute Corporation High Energy Accelerator Research Organization, Panasonic Corporation. Active years: 2014-2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
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1 out of 16,454 
Years Active: 2014-2020
Title: Yasuhiro Onishi: Innovator in X-ray Analysis and Plasma Processing
Introduction
Yasuhiro Onishi is a prominent inventor based in Osaka, Japan. He has made significant contributions to the fields of X-ray analysis and plasma processing, holding a total of 2 patents. His innovative work has advanced the capabilities of material analysis and processing technologies.
Latest Patents
Onishi's latest patents include a cell for X-ray analysis and an X-ray analysis apparatus. The cell for X-ray analysis enables simultaneous X-ray diffraction and X-ray absorption fine structure measurements of a material in the same field of view. This invention includes a furnace that holds the sample, a focused heater for heating, and multiple windows for X-ray interaction. The apparatus allows for efficient and precise measurements, enhancing the understanding of material properties.
Another notable patent is a plasma processing apparatus that consists of a stock unit, processing unit, and alignment chamber. This apparatus is designed to execute plasma processing on wafers housed in a conveyable tray. The alignment chamber features a rotating table for precise positioning of the wafers, ensuring accurate processing. A control device determines the alignment of the wafers, improving the reliability of the processing method.
Career Highlights
Yasuhiro Onishi has worked with notable companies such as Panasonic Corporation and the High Energy Accelerator Research Organization. His experience in these organizations has contributed to his expertise in advanced technologies and research.
Collaborations
Onishi has collaborated with esteemed colleagues, including Shogo Okita and Ken'ichi Kimijima. These partnerships have fostered innovation and development in their respective fields.
Conclusion
Yasuhiro Onishi's contributions to X-ray analysis and plasma processing demonstrate his commitment to advancing technology. His patents reflect a deep understanding of material science and processing techniques, making him a valuable figure in the innovation landscape.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile