The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2020
Filed:
Nov. 13, 2018
Inter-university Research Institute Corporation High Energy Accelerator Research Organization, Tsukuba-shi, Ibaraki, JP;
Ken'ichi Kimijima, Tsukuba, JP;
Masao Kimura, Tsukuba, JP;
Daiji Asahara, Osaka, JP;
Yasuhiro Onishi, Osaka, JP;
Abstract
Provided are a cell for X-ray analysis and an X-ray analysis apparatus that enable simultaneous X-ray diffraction and X-ray absorption fine structure measurements of a material (sample) in the same field of view on the sample (same position on the sample). The cell for X-ray analysis of the present invention enables simultaneous X-ray diffraction and X-ray absorption fine structure measurements of a sample in the same field of view on the sample and includes a furnace including a space where the sample is held and a focused heater heating the sample, a first window provided to the furnace and through which X-rays directed at the sample is incident, a second window provided to the furnace and from which X-rays emerging from the sample exit, a third window provided to the furnace, and a holder that positions the sample in the space. The cell for X-ray analysis makes it possible to simultaneously measure X-ray diffraction of the sample at outside of the second window and X-ray absorption fine structure of the sample through the third window.