Company Filing History:
Years Active: 2003
Title: Yasuhiro Kanda: Innovator in Semiconductor Technology
Introduction
Yasuhiro Kanda is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving contact structures and methods for manufacturing semiconductor devices.
Latest Patents
Kanda's latest patents include a contact structure and a method of forming the same, as well as a semiconductor device and a method of manufacturing the same. The contact structure involves a ternary metal silicide layer formed between a silicon substrate and a barrier layer. This structure includes a substrate with a silicon part, an insulating layer with a connection hole reaching the silicon part, a barrier layer on the inner surface of the connection hole, and a conductive member buried inside the barrier layer. The method of producing a semiconductor device outlines a process for fabricating a polymetal wiring structure using a polycrystalline silicon film, a reaction preventing film, and a tungsten film. This method includes steps to form a polycrystalline silicon film and a tungsten nitride film on a silicon substrate, followed by the formation of a tungsten film using a target of tungsten containing minimal fluorine. The process aims to reduce fluorine content, prevent film separation, and achieve preferable transistor properties.
Career Highlights
Yasuhiro Kanda is associated with Mitsubishi Electric Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the efficiency and performance of semiconductor devices.
Collaborations
Kanda has collaborated with notable colleagues such as Kazuyoshi Maekawa and Mitsuo Kimoto, contributing to various projects and innovations in the semiconductor field.
Conclusion
Yasuhiro Kanda's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing and device performance.