Yasuhiro Horike

Title: Yasuhiro Horike: Innovator in Plasma Processing Technology

Introduction

Yasuhiro Horike is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology, particularly with his innovative designs and patents. His work has implications for various industries, especially in semiconductor manufacturing.

Latest Patents

Yasuhiro Horike holds a patent for a plasma processing apparatus. This apparatus comprises a processing container, a waveguide tube for guiding microwaves generated by a microwave generator, and a flat antenna member connected to the waveguide. The antenna is designed to face a semiconductor wafer supported within the container. It features a plurality of short slits that are arranged concentrically or spirally. These slits are spaced apart in the widthwise direction at intervals of 5% to 50% of a guide wavelength of the microwave. Each slit has a length of +30% of the guide wavelength, centered with respect to half of the guide wavelength. This innovative design enhances the efficiency of plasma processing.

Career Highlights

Throughout his career, Yasuhiro Horike has worked with prominent companies, including Tokyo Electron Limited. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.

Collaborations

Yasuhiro has collaborated with notable individuals in his field, including Nobuo Ishii and Yasuo Kobayashi. These collaborations have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Yasuhiro Horike's contributions to plasma processing technology through his patent and collaborations highlight his role as an influential inventor. His work continues to impact the semiconductor industry and showcases the importance of innovation in technology.