The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 1997
Filed:
May. 24, 1996
Nobuo Ishii, Yamanashi-ken, JP;
Yasuo Kobayashi, Nirasaki, JP;
Naohisa Goto, Tsuchihashi, Miyamae-ku, Kawasaki-shi, Kanagawa-ken, JP;
Makoto Ando, Saiwai-ku, Kawasaki-shi, Kanagawa-ken, JP;
Junichi Takada, Funabashi-shi, Chiba-ken, JP;
Yasuhiro Horike, Hoya-shi, Tokyo, JP;
Tokyo Electron Limited, Tokyo, JP;
Other;
Abstract
A plasma processing apparatus comprises a processing container, a waveguide tube for guiding microwaves generated by a microwave generator, and a flat antenna member connected to the wave guide and disposed in the container to face a semiconductor wafer supported in the container. The antenna includes a plurality of short slits concentrically or spirally arranged in the antenna. The slits are spaced apart in the widthwise direction at intervals of 5% to 50% of a guide wavelength of the microwave, and each of the slits has a length of +30% of the guide wavelength centered with respect to half of the guide wavelength.