Yokohama, Japan

Yasuhiro Fukaura

This inventor holds 3 USPTO granted patents. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2003-2005.


% Patents Active = 33.3

Average Co-Inventor Count = 1.4

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Kanagawa-ken, JP (2003)
  • Yokohama, JP (2003 - 2005)

Company Filing History:


Years Active: 2003-2005

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3 patents (USPTO):Explore Patents

Title: Yasuhiro Fukaura: Innovator in Semiconductor Technology

Introduction

Yasuhiro Fukaura is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative semiconductor devices and manufacturing methods that enhance performance and efficiency.

Latest Patents

Fukaura's latest patents include a semiconductor device with a glue layer in an opening. This invention features an element isolation region in a semiconductor substrate, an active area, and a glue layer that plays a crucial role in the device's functionality. Another notable patent is a method of manufacturing a semiconductor device with a glue layer in the opening. This method involves forming a glue layer on an active area and a shallow trench isolation, ensuring effective electrical connections within the device.

Career Highlights

Yasuhiro Fukaura has built a successful career at Kabushiki Kaisha Toshiba, where he has been instrumental in advancing semiconductor technologies. His innovative approaches have led to the development of devices that meet the growing demands of modern electronics.

Collaborations

Fukaura has collaborated with notable coworkers, including Hisato Oyamatsu and Masahiro Inohara. Their combined expertise has contributed to the success of various projects and patents in the semiconductor field.

Conclusion

Yasuhiro Fukaura's contributions to semiconductor technology exemplify the spirit of innovation. His patents and collaborative efforts continue to influence the industry, paving the way for future advancements.

Profile summary based on public USPTO records.
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