Reno, NV, United States of America

Yasuhiko Sentoku



Average Co-Inventor Count = 5.6

ph-index = 4

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 2009-2018

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5 patents (USPTO):Explore Patents

Title: Yasuhiko Sentoku: Innovator in Target Fabrication Technologies

Introduction

Yasuhiko Sentoku is a notable inventor based in Reno, NV (US). He has made significant contributions to the field of target fabrication technologies, holding a total of 5 patents. His work focuses on innovative methods and materials that enhance the efficiency and effectiveness of target production.

Latest Patents

One of Yasuhiko Sentoku's latest patents is titled "Targets and processes for fabricating same." This patent describes targets that include a metal layer and define a hollow inner surface. The hollow inner surface features an internal apex, with the distance between at least two opposing points of the internal apex being less than about 15 μm, and in particular examples, less than about 1 μm. The targets are designed to be free-standing and can take various shapes, including cones, pyramids, hemispheres, and capped structures. The patent also outlines methods for forming these targets using lithographic techniques, such as photolithographic techniques. In particular examples, a target mold is created from a silicon wafer, and one or more sides of the mold are coated with a target material, such as one or more metals.

Career Highlights

Yasuhiko Sentoku has worked at the University of Nevada, where he has contributed to research and development in his field. His innovative approaches have garnered attention and respect within the scientific community.

Collaborations

Some of Yasuhiko Sentoku's notable coworkers include Thomas E Cowan and Steven Malekos. Their collaborative efforts have further advanced the research and applications of target fabrication technologies.

Conclusion

Yasuhiko Sentoku's contributions to target fabrication technologies demonstrate his commitment to innovation and excellence in his field. His patents and collaborative work continue to influence advancements in this area.

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