This inventor holds 1 USPTO granted patent. Top assignee: Future Vision Inc.. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: Yasuhiko Fukuchi: Innovator in Charge Neutralization Technology
Introduction
Yasuhiko Fukuchi is a notable inventor based in Sendai, Japan. He has made significant contributions to the field of charge neutralization technology, particularly in applications involving glass substrates. His innovative approach has led to the development of a unique patent that enhances the precision of soft X-ray irradiation.
Latest Patents
Fukuchi holds a patent for a "Charge Neutralizer for Glass Substrate." This invention provides a charge neutralizer that accurately irradiates soft X-rays into a narrow gap after lifting a glass substrate. The system introduces soft X-rays into a gap 'd' from the charge neutralizer, which are then detected by a soft X-ray optical axis monitor. The mounting position is adjusted based on the detection output, allowing for precise optical axis alignment. Furthermore, a control unit manages the gap adjusting means to ensure effective charge neutralization, while monitoring the charged potential with an electrometer.
Career Highlights
Yasuhiko Fukuchi is associated with Future Vision Inc., where he continues to innovate and develop advanced technologies. His work has been instrumental in improving the efficiency and accuracy of charge neutralization processes in various applications.
Collaborations
Fukuchi collaborates with talented individuals such as Hitoshi Inaba and Kazuyoshi Nakajima. Their combined expertise contributes to the advancement of technology in their field.
Conclusion
Yasuhiko Fukuchi's contributions to charge neutralization technology exemplify the impact of innovative thinking in the realm of scientific advancement. His patent and ongoing work at Future Vision Inc. highlight the importance of precision in technological applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile