Chitose, Japan

Yasuhide Fujioka

This inventor holds 4 USPTO granted patents. Top assignees: Hitachi, Ltd., Mitsumi Electric Company Ltd., Hitachi Hokkai Semiconductor Ltd.. Active years: 1997-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuhide Fujioka. Retrieved from https://idiyas.com/inventor/yasuhide-fujioka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 75.0

Average Co-Inventor Count = 1.5

ph-index = 2

Forward Citations = 49(Granted Patents)


Location History:

  • Fuchu, JP (1997)
  • Tama-Shi, JP (2009)
  • Chitose, JP (1999 - 2011)

Company Filing History:


Years Active: 1997-2011

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4 patents (USPTO):Explore Patents

Title: Yasuhide Fujioka: Innovator in Semiconductor Technology

Introduction

Yasuhide Fujioka is a notable inventor based in Chitose, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work focuses on the development of advanced semiconductor pressure sensors, which have applications in various industries.

Latest Patents

One of his latest patents is for a semiconductor pressure sensor and fabrication method thereof. This invention includes a diaphragm, a resistive element positioned at the upper portion of the diaphragm, and an insulating film that covers both the resistive element and the diaphragm. The design features a via that penetrates the insulating film to contact the resistive element, along with wiring that connects electrically to the resistive element through the via. The insulating film is designed with a concave portion that has a flat bottom face, where the wiring is arranged, ensuring that the depth of the concave portion matches the thickness of the wiring.

Another significant patent by Fujioka is for a semiconductor pressure sensor and method for manufacturing it. This invention also includes a diaphragm and a resistor on its top surface. An insulating film is formed over both the diaphragm and the resistor, featuring a penetrating part that exposes the top surface of the resistor. The wiring pattern connects from the exposed top surface of the resistor to the top surface of the insulating film. The design ensures that the distance between specific crossing parts meets precise dimensional requirements, enhancing the sensor's performance.

Career Highlights

Throughout his career, Yasuhide Fujioka has worked with prominent companies such as Hitachi, Ltd. and Mitsumi Electric Company Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Fujioka has collaborated with notable colleagues, including Naokatsu Suwanai and Hiroyuki Uchiyama. These partnerships have likely fostered a creative environment that has led to advancements in their respective fields.

Conclusion

Yasuhide Fujioka is a distinguished inventor whose work in semiconductor pressure sensors has made a significant impact on technology. His patents reflect a commitment to innovation and excellence in engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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