Tama, Japan

Yasuaki Suzuki

This inventor holds 2 USPTO granted patents. Top assignee: Asm Japan K.k.. Active years: 2009-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuaki Suzuki. Retrieved from https://idiyas.com/inventor/yasuaki-suzuki-px50rtl2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 50.0

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2009-2011

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2 patents (USPTO):Explore Patents

Title: Yasuaki Suzuki: Innovator in Plasma Treatment Technologies

Introduction

Yasuaki Suzuki is a notable inventor based in Tama, Japan. He has made significant contributions to the field of plasma treatment technologies, holding a total of 2 patents. His work focuses on enhancing processes in plasma chemical vapor deposition (CVD), which are crucial for various industrial applications.

Latest Patents

One of Yasuaki Suzuki's latest patents is titled "Method of plasma treatment using amplitude-modulated RF power." This innovative method involves processing a substrate by plasma CVD, which includes forming a film on a substrate placed on a susceptor by applying RF power in the presence of a film-forming gas. Upon completion of this step, amplitude-modulated RF power is applied in the absence of a film-forming gas to reduce the floating potential of the substrate.

Another significant patent is the "DC bias voltage measurement circuit and plasma CVD apparatus comprising the same." This invention provides a circuit for measuring DC bias voltage occurring in an ungrounded electrode of a plasma processing apparatus. It includes a first terminal connected to the RF power source, a second terminal for determining the DC bias voltage, and resistances and a condenser configured to ensure accurate measurements.

Career Highlights

Yasuaki Suzuki is currently employed at Asm Japan K.K., where he continues to develop and refine technologies related to plasma processing. His expertise in this area has positioned him as a key player in advancing the capabilities of plasma CVD applications.

Collaborations

Throughout his career, Yasuaki has collaborated with notable colleagues, including Mitsutoshi Shuto and Yasushi Fukasawa. These partnerships have fostered innovation and contributed to the successful development of his patented technologies.

Conclusion

Yasuaki Suzuki's contributions to plasma treatment technologies exemplify the impact of innovative thinking in industrial applications. His patents reflect a commitment to advancing the field and improving processes that are essential for modern manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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