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For the Inventor, By the Inventor

Hadano, Japan

Yasuaki Fukuda

This inventor holds 27 USPTO granted patents, primarily in X-Ray Lithography. Top assignee: Canon Kabushiki Kaisha. Active years: 1991-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuaki Fukuda. Retrieved from https://idiyas.com/inventor/yasuaki-fukuda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 27

% Patents Active = 100.0

Average Co-Inventor Count = 2.8

ph-index = 11

Forward Citations = 428(Granted Patents)


Location History:

  • Hatano, JP (1992)
  • Machida, JP (1992 - 1995)
  • Hadano, JP (1991 - 1998)
  • Utsunomiya, JP (1998 - 2004)

Company Filing History:

goldMedal27 out of 92,994 
 
Canon Kabushiki Kaisha
 patents

Years Active: 1991-2004

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Areas of Expertise:
Exposure Apparatus
X-Ray Mask Structure
Multilayer Film
X-Ray Exposure Method
Lithographic Mask
Reflection Device
X-Ray Microscope
Device Manufacturing Method
Soft X-Ray
Inspection Process
Cleaning Optical Elements
Projection Exposure System
27 patents (USPTO):Explore Patents
1. 6819396 - Exposure apparatus, and device manufacturing method (2004-11-16),
2. 6167111 - Exposure apparatus for synchrotron radiation lithography (2000-12-26),
3. 5808312 - System and process for inspecting and repairing an original (1998-09-15),
4. 5751780 - X-ray mask structure, preparation thereof and X-ray exposure method (1998-05-12),
5. 5656398 - Method of making X-ray mask structure (1997-08-12),
6. 5607733 - Process for preparing an X-ray mask structure (1997-03-04),
7. 5606586 - X-ray exposure method and apparatus and device manufacturing method (1997-02-25),
8. 5528654 - Multilayer film for X-rays (1996-06-18),
9. 5469489 - Production method of an x-ray mask structure, an x-ray mask structure (1995-11-21),
10. 5433988 - Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray (1995-07-18),
11. 5390228 - Method of and apparatus for stabilizing shapes of objects, such as (1995-02-14),
12. 5356686 - X-ray mask structure (1994-10-18),
13. 5335259 - X-ray exposure apparatus (1994-08-02),
14. 5333167 - Mask structure for x-ray exposure and x-ray exposure device and method (1994-07-26),
15. 5310603 - Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray (1994-05-10),

Title: **Innovations of Yasuaki Fukuda: Pioneering Patents in Exposure Apparatus Technology**

Introduction

Yasuaki Fukuda, a prominent inventor based in Hadano, Japan, has made significant contributions to the field of optical engineering through his 27 patents. His work primarily focuses on exposure apparatuses and device manufacturing methods, crucial for advancements in lithography and semiconductor technologies.

Latest Patents

Fukuda's recent innovations include two noteworthy patents:

1. **Exposure Apparatus and Device Manufacturing Method** - This patent discloses an exposure apparatus that features an optical element, a gas supplying unit, and an organic compound decomposition mechanism. This unique structure effectively prevents the adhesion of organic compounds to the optical element, eliminating the need for multiple filters in combination.

2. **Exposure Apparatus for Synchrotron Radiation Lithography** - This device is designed to transfer a mask pattern onto a substrate using radiation light from a synchrotron radiation light source. It contains a first mirror that collects the radiation light and a second mirror that reflects it onto the mask. The configuration of these mirrors, with specific concave and convex shapes, optimizes the projection of light rays enabling high-precision lithography.

Career Highlights

Fukuda has established his career at Canon Kabushiki Kaisha, a leading company renowned for its innovations in imaging and optical technologies. His work has not only advanced the technical capabilities of their products but has also positioned the company at the forefront of lithographic advancements.

Collaborations

Throughout his professional journey, Fukuda has collaborated with esteemed coworkers such as Yutaka Watanabe and Takashi Iizuka. Together, they have worked on developing cutting-edge technologies that have significantly impacted the industry.

Conclusion

Yasuaki Fukuda's impressive portfolio of patents illustrates his dedication to innovation in exposure apparatus technology. His contributions continue to influence the fields of optics and semiconductor manufacturing, ensuring that Canon Kabushiki Kaisha remains a key player in advancements within the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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