Canon Kabushiki Kaisha

Yasuaki Fukuda

Yutaka Watanabe

Takashi Iizuka

Masahito Niibe

Masami Hayashida

Shigetaro Ogura

Akira Miyake

Shunichi Uzawa

Nobutoshi Mizusawa

Masayuki Suzuki

Ryuichi Ebinuma

Shigeyuki Matsumoto

Mitsuaki Amemiya

Noritaka Mochizuki

Takao Kariya

Takeshi Miyachi

Hideo Kato

Shinichi Hara

Noriyuki Nose

Nobuo Kushibiki

Hiroshi Maehara

Keiko Chiba

Tsutomu Ikeda

Setsuo Minami

Masami Tsukamoto

Yuji Chiba

Hidehiko Fujioka

Shinichiro Uno

Masayuki Tanabe

Yasuo Kawai

Hirofumi Shibata

Disclosed is an exposure apparatus which includes an optical element, a gas supplying unit for supplying a predetermined gas around the optical element, and an organic compound decomposition mechanism for decomposing an organic compound in the gas. This structure prevents adhesion of organic compounds to the optical element without a necessity of using many filters in combination.

Exposure apparatus, and device manufacturing method

An apparatus for transferring a pattern of a mask onto a substrate with radiation light from a synchrotron radiation light source, includes a first mirror for collectively reflecting radiation light from the synchrotron radiation light source, and a second mirror for reflecting radiation light from the first mirror and for projecting the same to the mask. When a light ray advancing from a light emission point of the light source toward a center of a predetermined region of the mask, to be transferred to the substrate, is taken as a chief ray, when a normal to each of the first and second mirrors at an incidence position of a corresponding chief ray is taken as a Z axis, when a direction perpendicular to a plane defined by the Z axis of each mirror and a corresponding chief ray is taken as an X axis, and when a Y axis is taken along a direction perpendicular to the Z axis and X axis of each mirror, the first mirror has a reflection surface of a shape which is concave with respect to the X axis direction and concave with respect to the Y axis direction, while the second mirror has a reflection surface of a shape which is convex with respect to the Y axis direction.

Exposure apparatus for synchrotron radiation lithography

An original inspecting and repairing system includes an inspecting device having at least one of a vacuum ultraviolet ray microscope and an X-ray microscope, for inspecting an original, and a processing device for processing the original on the basis of the inspection. This practically enables inspection and repair of any fault of a reflection type original.

System and process for inspecting and repairing an original

An X-ray mask structure comprises an X-ray transmissive film, an X-ray absorptive member held on the X-ray transmissive film and supporting frame for supporting the X-ray transmissive film. The X-ray absorptive member is constituted of crystalline grains having a grain boundary size of 1 .mu.m or larger, or has a density of 90% or more relative to the density of the bulk material.

X-ray mask structure, preparation thereof and X-ray exposure method

A method of making an X-ray mask structure having an X-ray absorber in a desired pattern on the surface of a support film held by a frame. The method includes a step of patterning the X-ray absorber, including a drawing step that utilizes charged particles, and a step of thereafter providing the frame with a magnetic member. The frame and the support film each include a non-magnetic material.

Method of making X-ray mask structure

A process for preparing an X-ray mask structure comprises an X-ray transmissive film, an X-ray absorptive member held on the X-ray transmissive film and supporting frame for supporting the X-ray transmissive film. The X-ray absorptive member is constituted of crystalline grains having a grain boundary size of 1 .mu.m or larger, or has a density of 90% or more relative to the density of the bulk material.

Process for preparing an X-ray mask structure

An exposure method using X-rays from a synchrotron radiation source includes determining a relationship between an X-ray intensity distribution and an exposure amount distribution in an exposure area; and effecting exposure operation while controlling a dose amount for respective positions in the exposure area using the relationship, wherein the dose amount is controlled by changing a driving profile of a movable shutter for controlling the exposure operation, and wherein the relationship is in the form of a proportional coefficient between an X-ray intensity and the exposure amount as a function of position information in the exposure area.

X-ray exposure method and apparatus and device manufacturing method

A multilayer film for X-rays comprising two kinds of films having different refractive indices, deposited alternately, wherein one of said two kinds of films which has smaller refractive index consists of an alloy containing Co and Cr. The multilayer film is capable of being utilized as an optical element such as a reflection mirror or a reflection-type X-ray mask.

Multilayer film for X-rays

The present invention provides a simple and easy processing method for producing an X-ray mask structure having an X-ray absorber whose side walls have waviness. More specifically, in accordance with the present invention, the method for producing an X-ray mask structure which comprises an X-ray absorber, an X-ray transmissive membrane for supporting the X-ray absorber, and a supporting frame for supporting the X-ray transmissive membrane, includes a step of forming the X-ray absorber by depositing an X-ray absorber material in the regions between resist patterns, the above resist patterns having waviness on the side walls of the resist patterns.

Production method of an x-ray mask structure, an x-ray mask structure

A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layers primarily consists of at least one of single elements, such as ruthenium, or of a boride carbide, silicate, nitride oxide of a transition metal. The second layers primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).

Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray

A temperature distribution of an object, such as an optical element, onto which radiation energy is irradiated, is measured. The change of the shape of the object is controlled by varying the temperature of a part of the object on the basis of the measured temperature distribution to stabilize the shape of the object. Also, the shape of the object being irradiated is stabilized by causing the same temperature distribution in the object when in the thermally stable condition to be generated in the object while it is being irradiated. If the shapes of masks used to manufacture semiconductor devices are stabilized by using the above methods, highly integrated semiconductor devices can be manufactured.

Method of and apparatus for stabilizing shapes of objects, such as

An X-ray mask structure includes a mask substrate having a pattern; a supporting frame for carrying and supporting the mask substrate; and an adhesive material for fixing the mask substrate to the supporting frame; wherein a stress releasing groove is formed in at least one of the mask substrate and the supporting frame.

X-ray mask structure

An X-ray apparatus includes an X-ray pickup window through which synchrotron radiation light is projected, the X-ray pickup window having an X-ray transmission film; and a correcting system for correcting an intensity distribution of the synchrotron radiation light; wherein the X-ray transmission film has at least one of a film thickness distribution and a transmissivity distribution changing substantially in a predetermined direction; and wherein the X-ray transmission film is so disposed that the predetermined direction is substantially aligned with the direction of change of the intensity distribution of the synchrotron radiation light.

X-ray exposure apparatus

A mask structure for X-ray exposure comprises a retaining frame, a supporting frame, a mask support and an absorber pattern. The mask structure possesses a function for detecting a state change of the mask structure from its steady state.

Mask structure for x-ray exposure and x-ray exposure device and method

A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layer primarily consists of at least one of single elements, such as ruthenium or of a boride, carbide, silicide, nitride oxide of a transition metal. The second layer primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).

Growing community of inventors

Hadano, Japan

Yasuaki Fukuda