The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 1994
Filed:
Jan. 14, 1994
Applicant:
Inventors:
Hidehiko Fujioka, Yamato, JP;
Takeshi Miyachi, Zama, JP;
Yasuaki Fukuda, Hadano, JP;
Yuji Chiba, Isehara, JP;
Nobutoshi Mizusawa, Yamato, JP;
Takao Kariya, Hino, JP;
Shunichi Uzawa, Tokyo, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G21K / ;
U.S. Cl.
CPC ...
428 65 ; 428172 ; 428201 ; 430-5 ; 378 35 ;
Abstract
An X-ray mask structure includes a mask substrate having a pattern; a supporting frame for carrying and supporting the mask substrate; and an adhesive material for fixing the mask substrate to the supporting frame; wherein a stress releasing groove is formed in at least one of the mask substrate and the supporting frame.