Company Filing History:
Years Active: 2016-2019
Title: Yaron Ish-Shalom: Innovator in Optical Metrology
Introduction
Yaron Ish-Shalom is a notable inventor based in Kyryat Tivon, Israel. He has made significant contributions to the field of optical metrology, holding a total of 3 patents. His work focuses on enhancing the efficiency and accuracy of wafer notch detection and illumination systems.
Latest Patents
One of Yaron's latest patents is related to wafer notch detection. This patent describes methods and modules for efficiently estimating the position of a wafer notch. The process involves capturing an image of specified regions of the wafer, identifying a principal angle in a transformation, and converting it into polar coordinates. The wafer axes are then recovered from the identified principal angle, which represents the dominant orientations of geometric primitives in the captured region. This method may include selecting regions that enhance the identification and recovery of the axes, optimizing image quality and detection efficiency through multiple images and regions.
Another significant patent involves systems for providing illumination in optical metrology. This system is designed to combine illumination beams from various sources to deliver light at selected wavelengths to a measurement head. The intensity and spatial coherence of the illumination are controlled, allowing for precise measurements. The system utilizes a broadband illumination source that provides a continuous range of wavelengths, enhancing the capabilities of optical metrology.
Career Highlights
Yaron Ish-Shalom is currently employed at Kla Tencor Corporation, where he continues to innovate in the field of optical metrology. His work has been instrumental in advancing technologies that improve measurement accuracy and efficiency in various applications.
Collaborations
Yaron collaborates with several talented individuals in his field, including Gregory Brady and Andrei V Shchegrov. Their combined expertise contributes to the development of cutting-edge technologies in optical metrology.
Conclusion
Yaron Ish-Shalom is a prominent inventor whose work in optical metrology has led to significant advancements in wafer notch detection and illumination systems. His contributions continue to shape the future of measurement technologies.
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