Yaozhi Hu

Title: Yaozhi Hu: Innovator in Thin Oxide Film Technology

Introduction

Yaozhi Hu is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology, particularly in the area of thin oxide films on silicon substrates. His innovative approach has implications for various applications in the electronics industry.

Latest Patents

Yaozhi Hu holds a patent for a "Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures." This patent describes a plasma-assisted low-temperature radical oxidation process. The oxidation is selective to metals or metal oxides that may be present alongside the silicon being oxidized. Selectivity is achieved through the careful selection of process parameters, primarily the ratio of H2 to O2 gas. The process window can be expanded by injecting H2O steam into the plasma, allowing for the oxidation of silicon in the presence of materials like TiN and W at relatively low temperatures. The use of an apparatus with remote plasma and flowing radicals enhances selective oxidation while preventing ions from reaching the substrate.

Career Highlights

Yaozhi Hu is currently employed at Mattson Technology, Inc., where he continues to develop innovative solutions in semiconductor manufacturing. His work has been instrumental in advancing the technology used in the production of electronic devices.

Collaborations

Throughout his career, Yaozhi Hu has collaborated with esteemed colleagues, including Bruce W Peuse and Paul Janis Timans. These collaborations have contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Yaozhi Hu's contributions to the field of thin oxide film technology exemplify his innovative spirit and dedication to advancing semiconductor manufacturing processes. His work continues to influence the electronics industry positively.