Shanghai, China

Yanmin Cai

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Shanghai Micro Electronics Equipment Co., Ltd.. Active years: 2011.


% Patents Active = 100.0


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Yanmin Cai - Innovator in Precise Positioning Systems

Introduction

Yanmin Cai is a notable inventor based in Shanghai, China. He has made significant contributions to the field of precise positioning systems, particularly in the context of dual stage switching exposure technology. His innovative work has led to the development of a patent that enhances the efficiency and accuracy of wafer processing.

Latest Patents

Yanmin Cai holds a patent for a "Precise positioning system for dual stage switching exposure." This invention includes a base, a first wafer stage positioning unit for a pre-processing workstation, and a second wafer stage positioning unit for an exposure workstation. Each wafer stage positioning unit comprises a wafer stage, a motion positioning detector, an X-direction guide bar, and a Y-direction guide bar. The design allows for improved connectivity between adjacent workstations, enhancing the overall functionality of the system.

Career Highlights

Yanmin Cai is currently employed at Shanghai Micro Electronics Equipment Co., Ltd. His role at the company involves the application of his patented technology in real-world scenarios, contributing to advancements in microelectronics and semiconductor manufacturing.

Collaborations

Yanmin collaborates with talented individuals in his field, including Yingsheng Li and Xiaoping Li. Their combined expertise fosters an environment of innovation and progress within their projects.

Conclusion

Yanmin Cai's contributions to precise positioning systems exemplify the impact of innovative thinking in technology. His patent not only showcases his ingenuity but also plays a crucial role in advancing the microelectronics industry.

Profile summary based on public USPTO records.
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