The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2011
Filed:
Nov. 20, 2006
Yingsheng LI, Shanghai, CN;
Xiaoping LI, Shanghai, CN;
Zhiyong Yang, Shanghai, CN;
Jun Guan, Shanghai, CN;
Shaowen Gao, Shanghai, CN;
Wenfeng Sun, Shanghai, CN;
Gang LI, Shanghai, CN;
Yanmin Cai, Shanghai, CN;
Yingsheng Li, Shanghai, CN;
Xiaoping Li, Shanghai, CN;
Zhiyong Yang, Shanghai, CN;
Jun Guan, Shanghai, CN;
Shaowen Gao, Shanghai, CN;
Wenfeng Sun, Shanghai, CN;
Gang Li, Shanghai, CN;
Yanmin Cai, Shanghai, CN;
Shanghai Micro Electronics Equipment Co., Ltd., Shanghai, CN;
Abstract
A precise positioning system for dual stage switching exposure, which includes a base, a first wafer stage positioning unit disposed on the base for a pre-processing workstation, and a second wafer stage positioning unit for an exposure workstation. Each of the wafer stage positioning units includes a wafer stage, a motion positioning detector, an X-direction guide bar, and a Y-direction guide bar. The pre-processing workstation and the exposure workstation both have two X-direction guide bars positioned on and movable along the Y-direction guide bars. The X-direction guide bars of adjacent workstations can be connected to each other.