Company Filing History:
Years Active: 2004-2011
Title: Innovations of Yanghua He
Introduction
Yanghua He is a notable inventor based in Richardson, TX (US). He has made significant contributions to the field of chemical mechanical polishing, holding a total of 4 patents. His work is primarily associated with Texas Instruments Corporation, where he has developed innovative solutions that enhance manufacturing processes.
Latest Patents
One of Yanghua He's latest patents is for a chemical mechanical polishing pad that features an improved groove pattern. This invention provides a polishing pad with a plurality of first mesas and one or more second mesas defined on its surface. The first mesas are distributed across the pad, each with a specific surface area, while the second mesas, located in the center region, have a surface area at least twice that of the first mesas. Another significant patent involves a method for chemical mechanical planarization of a metal layer situated over a photoresist layer, as well as a method for manufacturing a micro pixel array. This method includes forming a metal layer over a photoresist layer and then planarizing it using a chemical mechanical planarization process.
Career Highlights
Yanghua He has established himself as a key figure in his field through his innovative patents and contributions to Texas Instruments Corporation. His work has not only advanced the technology in chemical mechanical polishing but has also paved the way for new manufacturing techniques.
Collaborations
Yanghua He has collaborated with several talented individuals, including Jingqiu Chen and Yaojian Leng. These collaborations have further enriched his work and contributed to the success of his projects.
Conclusion
Yanghua He is a distinguished inventor whose work in chemical mechanical polishing has led to multiple patents and significant advancements in manufacturing processes. His contributions continue to impact the industry positively.