The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 2011

Filed:

Sep. 20, 2005
Applicants:

Anthony Dicarlo, Richardson, TX (US);

Jingqiu Chen, Dallas, TX (US);

Yanghua He, Richardson, TX (US);

James C. Baker, Coppell, TX (US);

David A. Rothenbury, Garland, TX (US);

Inventors:

Anthony DiCarlo, Richardson, TX (US);

Jingqiu Chen, Dallas, TX (US);

Yanghua He, Richardson, TX (US);

James C. Baker, Coppell, TX (US);

David A. Rothenbury, Garland, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a method for planarizing a metal layer, and a method for manufacturing a micro pixel array. The method for planarizing the metal layer, without limitation, may include the steps of forming a metal layer over a photoresist layer, and then planarizing the metal layer using a chemical mechanical planarization process.


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