Jingqiu Chen

Title: Innovations by Jingqiu Chen

Introduction

Jingqiu Chen is a notable inventor based in Dallas, TX (US). He has made significant contributions to the field of chemical mechanical polishing, holding a total of 2 patents. His work is primarily associated with Texas Instruments Corporation, where he continues to innovate and develop new technologies.

Latest Patents

Jingqiu Chen's latest patents include a "Chemical mechanical polishing pad having improved groove pattern." This invention provides a polishing pad with a unique design featuring a plurality of first mesas and one or more second mesas. The second mesas are strategically placed in the center region of the pad, with a surface area at least twice that of the first mesas. Another significant patent is the "Method for chemical mechanical planarization of a metal layer located over a photoresist layer and a method for manufacturing a micro pixel array using the same." This method outlines a process for planarizing a metal layer over a photoresist layer, which is crucial for the manufacturing of micro pixel arrays.

Career Highlights

Throughout his career, Jingqiu Chen has demonstrated a strong commitment to advancing technology in his field. His work at Texas Instruments Corporation has positioned him as a key player in the development of innovative solutions for chemical mechanical polishing.

Collaborations

Jingqiu Chen has collaborated with talented coworkers such as Yanghua He and Yaojian Leng, contributing to a dynamic and innovative work environment.

Conclusion

Jingqiu Chen's contributions to the field of chemical mechanical polishing and his innovative patents highlight his expertise and dedication to advancing technology. His work continues to impact the industry positively.