This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2019-2023.
Location History:
- Oakland, CA (US) (2019)
- Santa Clara, CA (US) (2023)
Company Filing History:
Years Active: 2019-2023
Title: Innovations by Yangchung Lee in Semiconductor Processing
Introduction
Yangchung Lee is a notable inventor based in Oakland, CA, who has made significant contributions to the field of semiconductor processing. With a total of 2 patents to his name, Lee's work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing techniques.
Latest Patents
Lee's latest patents include innovative methods aimed at improving semiconductor processing. The first patent, titled "Chamber processes for reducing backside particles," describes methods that involve performing a first plasma treatment within a processing chamber to remove a first carbon-containing material. This is followed by a second plasma treatment to eliminate a first silicon-containing material, ultimately leading to the deposition of a second silicon-containing material and a second carbon-containing material overlying it.
The second patent, "Method of enhanced selectivity of hard mask using plasma treatments," outlines an etching process that achieves high selectivity when etching materials. This method includes exposing a cobalt mask layer to a fluorine-containing gas mixture to form a passivation film, followed by exposing the gate material to an etching gas mixture to etch through openings defined in the cobalt mask layer.
Career Highlights
Yangchung Lee is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to develop and refine innovative techniques that are crucial for advancing semiconductor technology.
Collaborations
Lee has collaborated with talented coworkers, including Xinyue Chen and Yi Zhou, who have contributed to his research and development efforts in semiconductor processing.
Conclusion
Yangchung Lee's contributions to semiconductor processing through his patents demonstrate his commitment to innovation in the field. His work continues to influence the industry and pave the way for future advancements in semiconductor technology.