Cheonan-si, South Korea

Yang Yeol Ryu

USPTO Granted Patents = 3 

Average Co-Inventor Count = 4.5

ph-index = 1


Company Filing History:


Years Active: 2023-2025

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3 patents (USPTO):Explore Patents

Title: Yang Yeol Ryu: Innovator in Substrate Processing Technology

Introduction

Yang Yeol Ryu is a prominent inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of substrate processing technology, holding a total of 3 patents. His innovative work focuses on improving the efficiency and effectiveness of substrate treatment processes.

Latest Patents

Yang Yeol Ryu's latest patents include an "Apparatus for smoothly exhausting the atmosphere in a processing space when rotating a substrate with liquid." This apparatus is designed to enhance the processing of substrates by incorporating a first and second processing unit, each with its own processing container and support unit. The exhaust unit plays a crucial role in maintaining optimal atmospheric conditions during the substrate rotation process.

Another notable patent is the "Apparatus for treating substrate," which features a processing container, a support unit for substrate rotation, a liquid supply unit for treating liquids, and an exhaust unit that effectively manages airflow within the inner space. This innovative design ensures that the air flow is introduced tangentially to the substrate's rotation, optimizing the treatment process.

Career Highlights

Yang Yeol Ryu is currently employed at Semes Co., Ltd., where he continues to develop cutting-edge technologies in substrate processing. His work has significantly advanced the capabilities of processing equipment, making him a valuable asset to his company and the industry.

Collaborations

Throughout his career, Yang Yeol Ryu has collaborated with talented individuals such as Ki Sang Eum and Ju Won Kim. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Yang Yeol Ryu's contributions to substrate processing technology exemplify his dedication to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate treatment, positioning him as a leading figure in his field.

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