The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2025

Filed:

Dec. 29, 2021
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Ju Won Kim, Chungcheongnam-do, KR;

Yang Yeol Ryu, Chungcheongnam-do, KR;

Hee Man Ahn, Seoul, KR;

Jun Ho Seo, Seoul, KR;

Dong Woon Park, Seoul, KR;

Sang Pil Yoon, Seoul, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); B05B 14/44 (2018.01); B60H 1/00 (2006.01); F24F 7/08 (2006.01); F24F 13/072 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); B05B 14/44 (2018.02); B60H 1/00564 (2013.01); F24F 7/08 (2013.01); F24F 13/072 (2013.01); H01L 21/67051 (2013.01); H01L 21/6715 (2013.01); H01L 21/67161 (2013.01); H01L 21/68764 (2013.01);
Abstract

An apparatus for processing a substrate includes a first processing unit configured to have a first processing container having a first inner space and a first support unit supporting and rotating the substrate in the first inner space; a second processing unit configured to have a second processing container having a second inner space and a second support unit supporting and rotating the substrate in the second inner space; an exhaust unit configured to exhaust the first and the second inner space; a first exhaust pipe configured to have a first exhaust port for introducing atmosphere of the first inner space and exhaust the atmosphere introduced through the first exhaust port to the integrated duct; and a second exhaust pipe configured to have a second exhaust port for introducing atmosphere of the second inner space and exhaust the atmosphere introduced through the second exhaust port to the integrated duct.


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