Semes Co., Ltd.

Yang Yeol Ryu

Ki Sang Eum

Ju Won Kim

Dong Woon Park

Sun Wook Jung

Sang Pil Yoon

Jun Ho Seo

Jung Yul Lee

Hee Man Ahn

Kyung Jin Seo

Gyeong Won Song

An apparatus for processing a substrate includes a first processing unit configured to have a first processing container having a first inner space and a first support unit supporting and rotating the substrate in the first inner space; a second processing unit configured to have a second processing container having a second inner space and a second support unit supporting and rotating the substrate in the second inner space; an exhaust unit configured to exhaust the first and the second inner space; a first exhaust pipe configured to have a first exhaust port for introducing atmosphere of the first inner space and exhaust the atmosphere introduced through the first exhaust port to the integrated duct; and a second exhaust pipe configured to have a second exhaust port for introducing atmosphere of the second inner space and exhaust the atmosphere introduced through the second exhaust port to the integrated duct.

Apparatus for smoothly exhausting the atmosphere in a processing space when rotating a substrate with liquid

The inventive concept provides an apparatus for treating a substrate. The apparatus comprises a processing container having an inner space; a support unit configured to support and rotate the substrate in the inner space; a liquid supply unit configured to supply a treating liquid to the substrate supported by the support unit; and an exhaust unit configured to exhaust an air flow from the inner space, wherein the exhaust unit includes an air flow guide duct with an inlet provided to introduce the air flow into the air flow guide duct in a tangential direction to a rotating direction of the substrate supported on the support unit.

Apparatus for treating substrate

An apparatus for treating a substrate includes a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit configured to supply treating liquid to the substrate supported by the support unit; and an exhaust unit configured to exhaust an air flow in the inner space, wherein the exhaust unit includes an air flow guide duct guiding a flow direction of an air flow flowing on the substrate to an outer side of the substrate due to a rotation of the substrate supported by the support unit, and the air flow guide duct having an inlet into which an air flow is introduced, the inlet provided at a substantially same level with the substrate supported by the support unit.

Growing community of inventors

Cheonan-si, South Korea

Yang Yeol Ryu