The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2023

Filed:

Nov. 22, 2021
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Ki Sang Eum, Cheonan-si, KR;

Gyeong Won Song, Cheonan-si, KR;

Yang Yeol Ryu, Cheonan-si, KR;

Kyung Jin Seo, Asan-si, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/16 (2006.01); B05C 15/00 (2006.01); B05C 11/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/162 (2013.01); B05C 11/02 (2013.01); B05C 15/00 (2013.01);
Abstract

The inventive concept provides an apparatus for treating a substrate. The apparatus comprises a processing container having an inner space; a support unit configured to support and rotate the substrate in the inner space; a liquid supply unit configured to supply a treating liquid to the substrate supported by the support unit; and an exhaust unit configured to exhaust an air flow from the inner space, wherein the exhaust unit includes an air flow guide duct with an inlet provided to introduce the air flow into the air flow guide duct in a tangential direction to a rotating direction of the substrate supported on the support unit.


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