Yang Han

Title: Yang Han - Innovator in Wafer Cleaning Technology

Introduction

Yang Han is a notable inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor manufacturing, particularly in wafer cleaning technology. His innovative approach has led to the development of a unique apparatus that enhances the cleanliness of wafers during the manufacturing process.

Latest Patents

Yang Han holds a patent for a wafer cleaning apparatus. This invention comprises a rotary shaft with a chuck that retains the wafer, a fixed shaft that passes coaxially through the rotary shaft, and upper and lower end covers that block the top and bottom of the fixed shaft. The fixed shaft is designed as a hollow shaft with exhaust holes on its wall. A gas inlet port in the lower end cover allows protective gas to enter the fixed shaft, creating positive pressure in the annular space between the fixed and rotary shafts. This design effectively prevents contaminants from diffusing to the back side of the wafer, thereby improving cleanliness after the cleaning process.

Career Highlights

Yang Han is currently employed at Acm Research (Shanghai) Inc., where he continues to innovate in the field of semiconductor technology. His work focuses on enhancing the efficiency and effectiveness of wafer cleaning processes, which are critical in the production of high-quality semiconductor devices.

Collaborations

Yang collaborates with talented colleagues, including Xiaofeng Tao and Xinping Deng. Together, they contribute to advancements in semiconductor manufacturing technologies.

Conclusion

Yang Han's contributions to wafer cleaning technology exemplify the importance of innovation in the semiconductor industry. His patented apparatus not only improves the cleanliness of wafers but also enhances the overall quality of semiconductor devices.