Tainan, Taiwan

Yang-Chou Lin


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020-2024

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3 patents (USPTO):Explore Patents

Title: Innovations of Yang-Chou Lin

Introduction

Yang-Chou Lin is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in metal interconnect structures. With a total of three patents to his name, Lin's work has had a considerable impact on the industry.

Latest Patents

One of Lin's latest patents is titled "Metal interconnect structure having cap layer with different thicknesses and method for fabricating the same." This invention includes a metal interconnect structure that features a first metal interconnection in an inter-metal dielectric (IMD) layer on a substrate, a second metal interconnection on the first, and a cap layer made of conductive material between the two. The design ensures that the top surface of the first metal interconnection is even with the top surface of the IMD layer.

Another significant patent is "Metal interconnect structure and method for fabricating the same." This method involves several steps, including forming a first metal interconnection in a first IMD layer, applying a cap layer, and performing etching processes to create openings and remove polymers. These innovations are crucial for enhancing the performance and reliability of semiconductor devices.

Career Highlights

Yang-Chou Lin is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to further develop his innovative ideas and contribute to cutting-edge technology.

Collaborations

Lin has collaborated with several talented individuals in his field, including Yi-How Chou and Tzu-Hao Fu. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

In summary, Yang-Chou Lin is a prominent inventor whose work in metal interconnect structures has significantly influenced the semiconductor industry. His patents reflect his innovative spirit and dedication to advancing technology.

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