Yan-Ting Lin

Title: Yan-Ting Lin: Innovator in Nanosheet Semiconductor Technology

Introduction

Yan-Ting Lin is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative work on nanosheet devices. His expertise and dedication to advancing technology have earned him recognition in the industry.

Latest Patents

Yan-Ting Lin holds a patent for a "Nanosheet semiconductor device and method for manufacturing the same." This patent outlines a method for creating a nanosheet semiconductor device that involves forming a poly gate on a nanosheet stack. The stack consists of at least one first nanosheet and at least one second nanosheet, which alternate with each other. The process includes recessing the nanosheet stack to create a source/drain recess near the poly gate, forming an inner spacer that laterally covers the first nanosheet, and selectively etching the second nanosheet.

Career Highlights

Yan-Ting Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Some of Yan-Ting Lin's notable coworkers include Chien-Chang Su and Chien-wei Lee. Their collaborative efforts in research and development have further propelled innovations in the semiconductor field.

Conclusion

Yan-Ting Lin's contributions to nanosheet semiconductor technology exemplify the impact of innovative thinking in the electronics industry. His patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key player in advancing semiconductor technology.