Beijing, China

Ya-Yu Wang


Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015-2016

where 'Filed Patents' based on already Granted Patents

2 patents (USPTO):

Title: The Innovations of Ya-Yu Wang

Introduction

Ya-Yu Wang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of quantum materials and devices. With a total of 2 patents, his work focuses on advancing the understanding and application of topological insulators.

Latest Patents

One of his latest patents is titled "Method for generating quantized anomalous hall effect." This patent describes a method for generating the quantum anomalous Hall effect by forming a topological insulator quantum well film on an insulating substrate. The film is doped with two elements to create a magnetically doped topological insulator quantum well film. This innovative approach allows for the manipulation of charge carriers within the film, enhancing its properties for potential applications in electrical devices. Another patent, "Electrical device having magnetically doped topological insulator quantum well film," outlines the construction of an electrical device that utilizes this advanced material. The device includes an insulating substrate and a magnetically doped topological insulator quantum well film, which is crucial for its functionality.

Career Highlights

Ya-Yu Wang has held positions at prestigious institutions such as Tsinghua University and the Chinese Academy of Sciences. His work at these institutions has allowed him to explore and develop groundbreaking technologies in the field of quantum physics.

Collaborations

Throughout his career, Wang has collaborated with notable scientists, including Qi-Kun Xue and Ke He. These collaborations have further enriched his research and contributed to the advancement of knowledge in quantum materials.

Conclusion

Ya-Yu Wang's contributions to the field of quantum materials and devices are noteworthy. His innovative patents and collaborations with esteemed colleagues highlight his commitment to advancing technology. His work continues to inspire future research in the realm of topological insulators and their applications.

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