Y C Kuo

Title: Y C Kuo: Innovator in Semiconductor Technology

Introduction

Y C Kuo is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to device design and functionality.

Latest Patents

Y C Kuo's latest patents include a two-dimensional structure to control flash operation and methods for forming the same. This invention involves a MOSFET device that features a floating gate layer formed within a trench in a substrate. The device also includes a tunnel dielectric layer located on the sidewalls and bottom of the trench, a control gate dielectric layer on the top surface of the floating gate layer, and a control gate layer on the top surface of the control gate dielectric layer. Additionally, sidewall spacers are located on the sidewalls of both the control gate dielectric layer and the control gate layer.

Career Highlights

Y C Kuo is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in advancing the capabilities of MOSFET devices, which are critical in modern electronic applications.

Collaborations

Y C Kuo has collaborated with notable colleagues, including Chi-Chung Jen and Yu-Chu Lin, who contribute to the dynamic environment of innovation at their workplace.

Conclusion

Y C Kuo's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced electronic devices.