The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2023

Filed:

Aug. 24, 2020
Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Inventors:

Chi-Chung Jen, Kaohsiung, TW;

Yu-Chu Lin, Tainan, TW;

Y. C. Kuo, Hsinchu, TW;

Wen-Chih Chiang, Hsinchu, TW;

Keng-Ying Liao, Tainan, TW;

Huai-Jen Tung, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/423 (2006.01); H10B 41/46 (2023.01); H01L 21/28 (2006.01); H10B 41/30 (2023.01); H01L 29/51 (2006.01);
U.S. Cl.
CPC ...
H10B 41/46 (2023.02); H01L 29/40114 (2019.08); H01L 29/42336 (2013.01); H10B 41/30 (2023.02); H01L 29/513 (2013.01);
Abstract

A MOSFET device and method of making, the device including a floating gate layer formed within a trench in a substrate, a tunnel dielectric layer located on sidewalls and a bottom of the trench, a control gate dielectric layer located on a top surface of the floating gate layer, a control gate layer located on a top surface of the control gate dielectric layer and sidewall spacers located on sidewalls of the control gate dielectric layer and the control gate layer.


Find Patent Forward Citations

Loading…