Singapore, Singapore

Xue Song Rao

This inventor holds 1 USPTO granted patent. Top assignee: Globalfoundries Singapore Pte. Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xue Song Rao. Retrieved from https://idiyas.com/inventor/xue-song-rao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Xue Song Rao: Innovator in Semiconductor Technology

Introduction

Xue Song Rao is a notable inventor based in Singapore, recognized for his contributions to semiconductor technology. His innovative work focuses on enhancing the manufacturing processes of memory devices, particularly in protecting polysilicon structures during etching.

Latest Patents

Xue Song Rao holds a patent titled "Methods of protecting elevated polysilicon structures during etching processes." This patent discloses various methods aimed at safeguarding elevated polysilicon structures during etching. One example of his method involves forming a layer stack above a semiconducting substrate for a memory device, creating a protective mask layer above the layer stack, and executing at least one etching process to define a gate electrode for a transistor while the protective mask remains in position.

Career Highlights

Xue Song Rao is currently employed at Globalfoundries Singapore Pte. Ltd., where he applies his expertise in semiconductor manufacturing. His work significantly contributes to advancements in memory device technology, showcasing his commitment to innovation in the field.

Collaborations

Xue collaborates with talented colleagues, including Alex See and Peng Zhou, who contribute to the dynamic environment of innovation at Globalfoundries.

Conclusion

Xue Song Rao's inventive work in semiconductor technology exemplifies the importance of innovation in enhancing manufacturing processes. His contributions, particularly in protecting polysilicon structures, are vital for the advancement of memory devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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