The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2013
Filed:
Dec. 08, 2011
Liang LI, Singapore, SG;
Huang Liu, Singapore, SG;
Alex See, Singapore, SG;
Soh Yun Siah, Singapore, SG;
Xue Song Rao, Singapore, SG;
Peng Zhou, Singapore, SG;
Liang Li, Singapore, SG;
Huang Liu, Singapore, SG;
Alex See, Singapore, SG;
Soh Yun Siah, Singapore, SG;
Xue Song Rao, Singapore, SG;
Peng Zhou, Singapore, SG;
GLOBALFOUNDRIES Singapore Pte Ltd, Singapore, SG;
Abstract
Disclosed herein are various methods of protecting elevated polysilicon structures during etching processes. In one example, the method includes forming a layer stack above a semiconducting substrate for a memory device, forming a protective mask layer above the layer stack of the memory device and performing at least one etching process to define a gate electrode for a transistor while the protective mask is in position above the layer stack for the memory device.