Xue-Feng Lin

Title: Innovations of Xue-Feng Lin

Introduction

Xue-Feng Lin is a notable inventor based in Boise, Idaho, recognized for his contributions to the field of integrated circuitry and vertical transistors. With a total of three patents to his name, Lin has made significant advancements in semiconductor technology.

Latest Patents

His latest patents include a method of forming a vertical transistor and integrated circuitry. The method involves creating a vertical transistor that comprises a top source/drain region, a bottom source/drain region, and a channel region positioned vertically between them. A gate is operatively laterally-adjacent to the channel region. The process utilizes multiple time-spaced microwave annealing steps to treat the channel region. This technique effectively reduces the average concentration of elemental-form hydrogen in the channel region to between 0.005 and less than 1 atomic percent.

Career Highlights

Xue-Feng Lin is currently employed at Micron Technology Incorporated, a leading company in the semiconductor industry. His work focuses on enhancing the performance and efficiency of electronic devices through innovative transistor designs.

Collaborations

Lin has collaborated with esteemed colleagues such as Hung-Wei Liu and Vassil N Antonov, contributing to the advancement of technology in their field.

Conclusion

Xue-Feng Lin's innovative work in vertical transistors and integrated circuitry showcases his expertise and commitment to advancing semiconductor technology. His contributions continue to influence the industry and pave the way for future innovations.