Xuanxuan Chen

Title: Innovations by Xuanxuan Chen in Metal Patterning Technologies

Introduction

Xuanxuan Chen is a notable inventor based in Hillsboro, Oregon, recognized for his contributions to the field of integrated circuit (IC) devices. With a total of three patents to his name, Chen has made significant advancements in metal patterning technologies that are essential for modern electronics.

Latest Patents

Chen's latest patents include "Directed self-assembly enabled subtractive metal patterning" and "Directed self-assembly enabled patterning over metal layers using assisting features." The first patent describes processes for forming tight-pitched patterned metal layers, such as metal gratings, through subtractive metal patterning. This innovative approach involves etching portions of a metal layer and replacing them with an insulator to create the desired metal grating. The use of directed self-assembly (DSA) for generating masks enhances the precision of the etching process. The second patent focuses on the formation of patterned layers over conductive layers using DSA-enabled processes, allowing for the creation of complex structures even over non-uniform features.

Career Highlights

Xuanxuan Chen is currently employed at Intel Corporation, where he continues to push the boundaries of technology in the semiconductor industry. His work has been instrumental in developing advanced manufacturing techniques that improve the performance and efficiency of IC devices.

Collaborations

Chen collaborates with talented colleagues, including Gurpreet Singh and Eungnak Han, who contribute to the innovative environment at Intel Corporation. Their combined expertise fosters a culture of creativity and technological advancement.

Conclusion

Xuanxuan Chen's innovative work in metal patterning technologies has made a significant impact on the field of integrated circuits. His patents reflect a commitment to advancing electronic manufacturing processes, ensuring that modern devices continue to evolve and improve.