Xuan Zeng

Title: Innovations of Xuan Zeng in Lithographic Hotspot Classification

Introduction

Xuan Zeng is a notable inventor based in Shanghai, China. He has made significant contributions to the field of lithography, particularly in the area of hotspot classification. With a total of two patents to his name, Zeng's work is recognized for its innovative approaches and practical applications in the industry.

Latest Patents

Xuan Zeng's latest patents focus on a dual function distance metric for accurate lithographic hotspot classification. This innovative metric utilizes radial and angular functions for pattern matching based hotspot clustering. The dual function distance metric is capable of handling patterns that contain multiple polygons, making it easy to compute and tolerant of small variations or shifts in shapes. Compared to an XOR distance metric pattern clustering, Zeng's dual function distance metric can achieve up to a 37.5% improvement in accuracy with a computational cost that is 2X to 4X more efficient in the context of cluster analysis. This reliability and accuracy make it highly desirable for various industry applications.

Career Highlights

Xuan Zeng is currently employed at Synopsys, Inc., where he continues to develop and refine his innovative technologies. His work has garnered attention for its potential to enhance the efficiency and effectiveness of lithographic processes.

Collaborations

Zeng collaborates with esteemed colleagues such as Charles C Chiang and Jing Guo, contributing to a dynamic and innovative work environment.

Conclusion

Xuan Zeng's contributions to lithographic hotspot classification through his innovative patents demonstrate his expertise and commitment to advancing technology in the field. His work not only improves accuracy but also enhances computational efficiency, making a significant impact on industry practices.