The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
Jun. 01, 2012
Charles C. Chiang, Saratoga, CA (US);
Jing Guo, Shanghai, CN;
Fan Yang, Shanghai, CN;
Subarnarekha Sinha, Palo Alto, CA (US);
Xuan Zeng, Shanghai, CN;
Charles C. Chiang, Saratoga, CA (US);
Jing Guo, Shanghai, CN;
Fan Yang, Shanghai, CN;
Subarnarekha Sinha, Palo Alto, CA (US);
Xuan Zeng, Shanghai, CN;
Synopsys, Inc., Mountain View, CA (US);
Abstract
An dual function distance metric for pattern matching based hotspot clustering is described. The dual function distance metric can handle patterns containing multiple polygons, is easy to compute, and is tolerant of small variations or shifts of the shapes. Compared with an XOR distance metric pattern clustering, the dual function distance metric can achieve up to 37.5% accuracy improvement with 2X-4X computational cost in the context of cluster analysis. The dual function distance metric is reliable and accurate for characterizing clips (e.g. hotspots), thereby making it desirable for industry applications.