Xuan-You Yan

Title: Xuan-You Yan: Innovator in Semiconductor Technology

Introduction

Xuan-You Yan is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the design and fabrication of gate electrodes. With a total of two patents to his name, Yan's work is recognized for its innovative approaches to improving semiconductor performance.

Latest Patents

Xuan-You Yan's latest patents focus on reducing metal gate overhang by forming a top-wide bottom-narrow dummy gate electrode. In this process, a polysilicon layer is formed over a substrate. The polysilicon layer is then etched to create a dummy gate electrode with a top portion that has a first lateral dimension and a bottom portion with a second lateral dimension. Notably, the first lateral dimension is greater than or equal to the second lateral dimension. This dummy gate electrode is subsequently replaced with a metal gate electrode, enhancing the overall efficiency of semiconductor devices.

Career Highlights

Xuan-You Yan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in technology.

Collaborations

Some of Xuan-You Yan's notable coworkers include Shih Wei Bih and Han-Wen Liao. Their collaborative efforts have further propelled innovation within their projects and have led to significant advancements in semiconductor technology.

Conclusion

Xuan-You Yan's contributions to the semiconductor industry through his innovative patents and collaborations highlight his role as a key inventor in this field. His work continues to influence the development of advanced semiconductor technologies.