Location History:
- San Jose, CA (US) (2005)
- Sunnyvale, CA (US) (2008 - 2010)
Company Filing History:
Years Active: 2005-2010
Title: Xinyun Xia: Innovator in Thin Film Technology
Introduction
Xinyun Xia is a prominent inventor based in Sunnyvale, CA, known for his contributions to the field of thin film technology. With a total of 4 patents to his name, he has made significant advancements that enhance the performance and reliability of semiconductor devices.
Latest Patents
Xinyun Xia's latest patents include innovative methods for annealing substrates and forming silicon oxide layers. One notable patent describes a multi-step anneal process for thin films, which involves annealing a substrate containing a trench with dielectric material at varying temperatures and atmospheres. This method aims to improve film densification and gap-fill capabilities. Another patent focuses on gap-fill depositions in the formation of silicon-containing dielectric materials, detailing a method that utilizes a continuous flow of silicon-containing precursors and oxidizing agents to create a silicon oxide layer on substrates.
Career Highlights
Xinyun Xia is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has positioned him as a key player in the development of advanced materials and processes that are critical for modern electronics.
Collaborations
Xinyun has collaborated with notable colleagues, including Nitin K Ingle and Vikash Banthia, contributing to a dynamic research environment that fosters innovation and technological advancement.
Conclusion
Xinyun Xia's work in thin film technology and his innovative patents reflect his commitment to advancing the semiconductor industry. His contributions continue to influence the development of more efficient and reliable electronic devices.