Xinxing Fan

Title: Xinxing Fan: Innovator in Photolithography Technology

Introduction

Xinxing Fan is a prominent inventor based in Beijing, China. He is known for his contributions to the field of photolithography, particularly in the development of methods and devices that enhance the efficiency of substrate preparation and photoresist drying.

Latest Patents

Xinxing Fan holds 1 patent for his innovative work. His patent focuses on a photolithography method, a method of preparing a flexible substrate, and a photoresist drying device. The photolithography method involves providing a base substrate with a material layer to be etched, coating it with photoresist, and drying the photoresist while performing a first exposure process.

Career Highlights

Throughout his career, Xinxing Fan has worked with notable companies in the technology sector. He has been associated with Chengdu BOE Optoelectronics Technology Co., Ltd. and BOE Technology Group Co., Ltd. These experiences have allowed him to refine his skills and contribute significantly to advancements in photolithography.

Collaborations

Xinxing Fan has collaborated with talented individuals in his field, including Cheng Tang and Zebin Sun. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Xinxing Fan's work in photolithography represents a significant advancement in the field, showcasing his expertise and innovative spirit. His contributions continue to influence the technology landscape, making him a noteworthy figure in the realm of inventions.