Boe Technology Group Co., Ltd.

Chengdu Boe Optoelectronics Technology Co., Ltd.

Xinxing Fan

Hao Zhang

Xudong Zhang

Cheng Tang

Zebin Sun

Zhen Zhen

Shitao Zhang

A photolithography method, a method of preparing a flexible substrate and a photoresist drying device are provided. The photolithography method includes: providing a base substrate on which a material layer to be etched is formed, in which the base substrate includes an intermediate region and a peripheral region surrounding the intermediate region; coating a layer of photoresist on the base substrate, in which the photoresist is coated in the intermediate region and the peripheral region, and is formed to cover the material layer to be etched; and drying the photoresist and simultaneously performing a first exposure process on the photoresist coated in the peripheral region.

Photolithography method, method of preparing flexible substrate and photoresist drying device

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Beijing, China

Xinxing Fan