This inventor holds 4 USPTO granted patents and 4 published patent applications. Top assignee: National Institute of Metrology, China. Active years: 2023-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023-2026
Title: Xinhua Dai: Innovator in Gas Detection Technology
Introduction
Xinhua Dai, based in Beijing, China, is a notable inventor known for his contributions in the field of gas detection technology. He holds a patent that showcases his innovative approach to quantitative detection of gases, an essential technology with applications across various industries.
Latest Patents
Dai's patent, titled "Apparatus and Method for Quantitative Detection of Gases," presents a groundbreaking apparatus that employs cavity ring-down spectroscopy. This device is designed to quantitatively detect any characteristic gas in a mixture of gases. The system integrates a sample processing device and a mass spectrometry unit, enabling comprehensive detection and analysis of gases without the need for standard gas references. This feature enhances flexibility and usability across diverse scenarios including laboratory testing, industrial site analysis, and environmental protection.
Career Highlights
Xinhua Dai is affiliated with the National Institute of Metrology, China, where he continues to conduct research and development in metrology and gas detection technologies. His work has helped advance the precision of gas measurements, contributing significantly to both scientific research and industrial applications.
Collaborations
During his career, Dai has collaborated with notable colleagues such as Zejian Huang and Xiang Fang. Together, they have worked on innovative projects that aim to improve the accuracy and efficiency of gas detection and analysis.
Conclusion
Xinhua Dai stands out as a key figure in the realm of gas detection, with his patented technology promising to reshape the landscape of environmental monitoring and industrial testing. His dedication to innovation continues to inspire future advancements in metrology and related fields.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile