Company Filing History:
Years Active: 2004-2011
Title: The Innovative Mind of Xingyuan Tang
Introduction
Xingyuan Tang, a distinguished inventor based in West Linn, Oregon, has made significant contributions to the field of semiconductor technology. With a total of nine patents to his name, Tang's work addresses critical challenges in film deposition processes and material science, showcasing his innovative spirit and technical prowess.
Latest Patents
Tang’s latest patents highlight his expertise in enhancing the quality and efficiency of silicon-based films. One of his notable inventions, titled "Method of eliminating small bin defects in high throughput TEOS films," introduces a high throughput Plasma-Enhanced Chemical Vapor Deposition (PECVD) process. This method effectively minimizes small bin defects in TEOS films by dedicating a station for temperature soaking while purging gas. This innovative approach not only curtails TEOS condensation on cold wafer surfaces but also significantly reduces defects, particularly during short temperature soaks.
Another noteworthy patent involves the development of "Low-K SiC copper diffusion barrier films." These barrier films, characterized by low dielectric constants, are suitable for various copper/inter-metal dielectric integration schemes. Composed of layers of silicon carbide with a high carbon content, these films provide a reduced effective dielectric constant compared to conventional barrier materials.
Career Highlights
Xingyuan Tang is currently employed at Novellus Systems Incorporated, a key player in the semiconductor manufacturing industry. His work at this company has been pivotal in advancing deposition technologies, reflecting his commitment to innovation and quality in semiconductor fabrication.
Collaborations
Throughout his career, Tang has had the opportunity to collaborate with notable colleagues, including Haiying Fu and Yongsik Yu. These collaborations have enhanced the scope of his research and contributed to the development of groundbreaking technologies within the field.
Conclusion
Xingyuan Tang exemplifies the spirit of innovation through his significant contributions to semiconductor technology. His patents not only address critical industry challenges but also pave the way for future advancements in material science and deposition processes. As he continues to explore new frontiers in technology, Tang remains a vital figure in the landscape of modern inventions.