Company Filing History:
Years Active: 2014-2017
Title: Innovations of Inventor Xing Liao
Introduction
Xing Liao is a prominent inventor based in Evanston, IL (US). He has made significant contributions to the field of lithography, holding a total of 4 patents. His work focuses on advanced methods and systems that enhance the precision and efficiency of patterning processes.
Latest Patents
One of Liao's latest patents is titled "Heat actuated and projected lithography systems and methods." This invention involves a method of patterning that includes dividing an image into frame sections and determining a tip pattern for each section. The process entails projecting patterns of radiation onto a tip array to selectively irradiate tips and pattern the substrate. Another notable patent is "Silicon pen nanolithography," which discloses methods using a tip array with pens attached to a backing layer. This innovative approach allows for lithography processes where tips coated with ink deposit patterns onto a substrate upon contact.
Career Highlights
Xing Liao is affiliated with Northwestern University, where he continues to advance research in lithography technologies. His work has garnered attention for its potential applications in various fields, including electronics and materials science.
Collaborations
Liao has collaborated with notable researchers such as Chad A. Mirkin and Adam B. Braunschweig. These partnerships have contributed to the development of cutting-edge technologies in the realm of nanolithography.
Conclusion
Xing Liao's innovative contributions to lithography demonstrate his commitment to advancing technology in this field. His patents reflect a deep understanding of patterning processes and their applications, positioning him as a key figure in modern invention.